| DOI | Trouver le DOI : https://doi.org/10.1116/1.587627 |
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| Auteur | Rechercher : Fallahi, M.1; Rechercher : Templeton, I. M.1; Rechercher : Chatenoud, F.1; Rechercher : Champion, G.1; Rechercher : Dion, M.; Rechercher : Barber, R.1 |
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| Affiliation | - Conseil national de recherches Canada. Institut des sciences des microstructures du CNRC
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| Format | Texte, Article |
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| Résumé | In this article the fabrication of circular gratings by electron-beam lithography (r-θ coordinates) and by focused ion-beam lithography (x-y coordinate) is presented. The differences between the two techniques, relevant to the fabrication of circular patterns, are described. The optimum writing strategies and the quality of circular gratings are compared. Electrically pumped circular-grating surface-emitting distributed Bragg reflector (DBR) lasers were fabricated by the two techniques. Room temperature cw operation of a circular-grating surface-emitting DBR laser is demonstrated. |
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| Date de publication | 1994-11 |
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| Dans | |
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| Langue | anglais |
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| Numéro NPARC | 12328195 |
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| Exporter la notice | Exporter en format RIS |
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| Signaler une correction | Signaler une correction (s'ouvre dans un nouvel onglet) |
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| Identificateur de l’enregistrement | e73da5e6-b2d2-44af-8fa1-93ee473c28b2 |
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| Enregistrement créé | 2009-09-10 |
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| Enregistrement modifié | 2020-04-27 |
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