| DOI | Resolve DOI: https://doi.org/10.1116/1.587627 |
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| Author | Search for: Fallahi, M.1; Search for: Templeton, I. M.1; Search for: Chatenoud, F.1; Search for: Champion, G.1; Search for: Dion, M.; Search for: Barber, R.1 |
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| Affiliation | - National Research Council of Canada. NRC Institute for Microstructural Sciences
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| Format | Text, Article |
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| Abstract | In this article the fabrication of circular gratings by electron-beam lithography (r-θ coordinates) and by focused ion-beam lithography (x-y coordinate) is presented. The differences between the two techniques, relevant to the fabrication of circular patterns, are described. The optimum writing strategies and the quality of circular gratings are compared. Electrically pumped circular-grating surface-emitting distributed Bragg reflector (DBR) lasers were fabricated by the two techniques. Room temperature cw operation of a circular-grating surface-emitting DBR laser is demonstrated. |
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| Publication date | 1994-11 |
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| In | |
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| Language | English |
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| NPARC number | 12328195 |
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| Export citation | Export as RIS |
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| Report a correction | Report a correction (opens in a new tab) |
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| Record identifier | e73da5e6-b2d2-44af-8fa1-93ee473c28b2 |
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| Record created | 2009-09-10 |
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| Record modified | 2020-04-27 |
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