"Spontaneous" formation of radicals from nitroso compounds. Inadvertent photolysis vs. molecule assisted homolysis

DOI	Trouver le DOI : https://doi.org/10.1021/ja00406a027
Auteur	Rechercher : Chatgilialoglu, C.¹; Rechercher : Ingold, K. U.¹
Affiliation du nom	Conseil national de recherches du Canada
Format	Texte, Article
Résumé	The formation of radicals by a "spontaneous" reaction between nitroso compounds and certain organic materials has often been reported in the literature and has generally been ascribed to a process of molecule assisted homolysis (MAH). Some selected "spontaneous" radical-forming processes involving trifluoronitrosomethane, nitrosobenzene, and 2,4,6-trichloronitrosobenzene have been reexamined. In many cases it has been found that the radicals are formed only when the sample is exposed to ordinary laboratory light. It is suggested that the role of light on other "spontaneous" radical-forming reactions should be investigated. © 1981 American Chemical Society.
Date de publication	1981
Dans	Journal of the American Chemical Society 103, nº 16 (1981) : 4833–4837.
Langue	anglais
Publications évaluées par des pairs	Oui
Numéro NPARC	21276469
Exporter la notice	Exporter en format RIS
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Identificateur de l’enregistrement	b1c19273-1697-4409-a341-3faa7bfcac50
Enregistrement créé	2015-10-13
Enregistrement modifié	2020-03-13