"Spontaneous" formation of radicals from nitroso compounds. Inadvertent photolysis vs. molecule assisted homolysis

From National Research Council Canada

DOIResolve DOI: https://doi.org/10.1021/ja00406a027
AuthorSearch for: 1; Search for: 1
Name affiliation
  1. National Research Council Canada
FormatText
TypeArticle
Journal titleJournal of the American Chemical Society
ISSN0002-7863
Volume103
Issue16
Pages4833–4837
Abstract
The formation of radicals by a "spontaneous" reaction between nitroso compounds and certain organic materials has often been reported in the literature and has generally been ascribed to a process of molecule assisted homolysis (MAH). Some selected "spontaneous" radical-forming processes involving trifluoronitrosomethane, nitrosobenzene, and 2,4,6-trichloronitrosobenzene have been reexamined. In many cases it has been found that the radicals are formed only when the sample is exposed to ordinary laboratory light. It is suggested that the role of light on other "spontaneous" radical-forming reactions should be investigated. © 1981 American Chemical Society.
Publication date
LanguageEnglish
Peer reviewedYes
NPARC number21276469
Export citationExport as RIS
Report a correctionReport a correction
Record identifierb1c19273-1697-4409-a341-3faa7bfcac50
Record created2015-10-13
Record modified2020-03-13
Report a problem on this page
Date modified: