Ultra-Thin Zirconium and Hafnium Silicate Films Deposited By MOCVD on Si100

From National Research Council Canada

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Affiliation
  1. National Research Council of Canada. NRC Institute for Microstructural Sciences
FormatText, Article
ConferenceHigh-k Dielectrics Symposium
NPARC number12346201
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Record identifierc21be32d-7d7b-4e23-bd19-25f2d0498e00
Record created2009-09-17
Record modified2020-04-16
Date modified: