A new KOH-based UV assisted wet etching technique and its alication to AlGaN/GaN HFET fabrication and characterization
A new KOH-based UV assisted wet etching technique and its alication to AlGaN/GaN HFET fabrication and characterization
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Format | Text, Article |
Conference | International Workshop on Nitride Semiconductors, 2000 |
Publication date | 2000 |
Publisher | Institute of Pure and Applied Physics |
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Language | English |
NPARC number | 12346331 |
Export citation | Export as RIS |
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Record identifier | 8a31afe4-6bdf-45ec-a2a5-8d9404c06f93 |
Record created | 2009-09-17 |
Record modified | 2020-12-18 |
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