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A new KOH-based UV assisted wet etching technique and its alication to AlGaN/GaN HFET fabrication and characterization

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Affiliation
  1. National Research Council of Canada. NRC Steacie Institute for Molecular Sciences
FormatText, Article
ConferenceInternational Workshop on Nitride Semiconductors, 2000
Publication date
PublisherInstitute of Pure and Applied Physics
In
  • Proceedings of International Workshop on Nitride Semiconductors (2000): 965–968.
Series
  • IPAP Conf Series, no. 1.
LanguageEnglish
NPARC number12346331
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Record identifier8a31afe4-6bdf-45ec-a2a5-8d9404c06f93
Record created2009-09-17
Record modified2020-12-18
Date modified: