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Characteristics of reactive magnetron sputtered ZnO films

DOITrouver le DOI : https://doi.org/10.1109/ULTSYM.1989.67012
AuteurRechercher : 1; Rechercher : 1; Rechercher : 1
Affiliation
  1. Conseil national de recherches Canada
FormatTexte, Article
ConférenceProceedings of the IEEE Ultrasonics Symposium, 3-6 Oct. 1989, Montreal, Quebec, Canada
SujetZinc oxide; Substrates; Piezoelectric films; Plasma measurements; Sputtering; Plasma temperature; Semiconductor films; Scanning electron microscopy; Crystallization; Cathodes
Résumé
Highly oriented, dense, and fine-grain polycrystalline ZnO films with an excellent surface flatness have been produced. The thin films were deposited by DC conical reactive magnetron sputtering. X-ray scanning and scanning electron microscopy were used to evaluate film crystalline structure, and electromechanical measurements were used to measure piezoelectric properties. The relative importance of experimental parameters influencing the film formation and quality is as follows: substrate distance and location with respect to the cathode, quality of substrate surface, oxygen flow and pressure, plasma-discharge power, and substrate temperature. Excellent films have been produced on glass, on thermally oxidized Si substrates, and on clean metallic thin films. Films having c-axis orientation of up to 17 degrees to the substrate normal have been successfully deposited on Al thin layers on Si-SiO/sub 2/ substrates by varying the substrate position with respect to the plasma. The best films produced on (lll) Si had X-ray rocking curve half-widths of 0.9 degrees; to the best of our knowledge this is the smallest value ever reported in the literature
Date de publication
Maison d’éditionIEEE
Dans
  • Proceedings of the IEEE Ultrasonics Symposium : 373–376.
Langueanglais
Publications évaluées par des pairsOui
Numéro du CNRCCNRC 30340
NRC-IGM89AP-401-892-G
Numéro NPARC23004235
Exporter la noticeExporter en format RIS
Signaler une correctionSignaler une correction (s'ouvre dans un nouvel onglet)
Identificateur de l’enregistrementbd2ce229-4648-4490-b089-01daebf5c84b
Enregistrement créé2018-10-12
Enregistrement modifié2020-03-17

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