| DOI | Trouver le DOI : https://doi.org/10.1116/1.588283 |
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| Auteur | Rechercher : Erickson, L. E.1; Rechercher : Champion, H. G.1; Rechercher : Albert, J.; Rechercher : Hill, K. O.; Rechercher : Malo, B.; Rechercher : Thériault, S.; Rechercher : Bilodeau, F.; Rechercher : Johnson, D. C. |
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| Affiliation | - Conseil national de recherches Canada. Institut des sciences des microstructures du CNRC
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| Format | Texte, Article |
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| Conférence | The 39th International symposium on electron, ion, and photon beams, Scottsdale, Arizona, USA, May 30 - June 2, 1995 |
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| Sujet | BRAGG REFLECTION; DIFFRACTION GRATINGS; FIBER OPTICS; ION IMPLANTATION; MASKING; RADIATION DOSES; SILICON IONS; SILICON OXIDES |
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| Résumé | Apodized fiber Bragg gratings show reductions in the unwanted sidebands from those of uniform Bragg grating. A phase mask whose diffraction efficiency varied from the center to the ends was fabricated by implanting a grating pattern in a SiO2 substrate with Si + + and wet etching in diluted HF. The phase mask diffraction efficiency vs ion dose was measured. Using this phase mask, apodized Bragg gratings were photoimprinted into fibers. The sidebands of the apodized fiber gratings were 26 dB below the peak of the central resonance compared to 12 dB for the uniform Bragg grating. The modeled values were 29 and 13.2 dB, respectively. |
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| Date de publication | 1995-11-01 |
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| Langue | anglais |
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| Numéro NPARC | 12339096 |
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| Exporter la notice | Exporter en format RIS |
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| Signaler une correction | Signaler une correction (s'ouvre dans un nouvel onglet) |
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| Identificateur de l’enregistrement | 66cc1517-32cb-41fd-b50d-3868155b7408 |
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| Enregistrement créé | 2009-09-11 |
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| Enregistrement modifié | 2020-04-29 |
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