| DOI | Trouver le DOI : https://doi.org/10.1021/jp0344489 |
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| Auteur | Rechercher : Mitchell, S. A.1 |
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| Affiliation | - Conseil national de recherches Canada. Institut Steacie des sciences moléculaires du CNRC
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| Format | Texte, Article |
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| Résumé | Photooxidation of hydrogen-terminated Si(111) surfaces in air has been studied by using optical second harmonic generation (SHG) in reflection from the silicon surface. The mechanism of photooxidation induced by a mercury pen lamp is shown to involve oxygen atoms produced by 185-nm photodissociation of O2 in the gas phase above the Si(111)-H surface. Several fundamental wavelengths were used for SHG, including two-photon resonant excitations that are characteristic of H-terminated and oxidized Si(111) surfaces. By focusing on the anisotropic part of the SHG response, the specific response of intra-bilayer Si-Si bonds was isolated. A pronounced nonmonotonic variation of the SHG signal was observed during photooxidation and also during oxidation of Si(111)-H surfaces in air in the dark. A simple model is described that relates modulations in the SHG signal with progressive oxidation of distinct layers of Si-Si bonds near the surface. An analysis suggests that inter- as well as intra-bilayer bonds are attacked by oxygen atoms at an early stage during photooxidation. |
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| Date de publication | 2003-07-23 |
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| Dans | |
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| Langue | anglais |
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| Publications évaluées par des pairs | Oui |
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| Numéro NPARC | 12333654 |
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| Exporter la notice | Exporter en format RIS |
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| Signaler une correction | Signaler une correction (s'ouvre dans un nouvel onglet) |
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| Identificateur de l’enregistrement | 21ed5c93-2702-4420-83e7-b68240992964 |
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| Enregistrement créé | 2009-09-10 |
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| Enregistrement modifié | 2023-08-11 |
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