| Auteur | Rechercher : Malac, M.; Rechercher : Egerton, R. |
|---|
| Format | Texte, Affiche |
|---|
| Conférence | 47th International Symposium of the American Vacuum Society, October 2-6, 2000, Boston, Massachusets |
|---|
| Description physique | 1 p. |
|---|
| Résumé | Oblique deposition onto a rotating substrate pre-patterned with suitable nuclei results in the growth of regular arrays of pillars or helices.@footnote 1@ The repeat distance of such arrays can be varied from below 20 nm to over one micrometer. To improve the control over the microstructure it is beneficial to understand the growth mechanism on a microscopic scale. We find that the helices and pillars (within regular or random-nucleated arrays) are composed of many fibers growing simultaneously. The helix-arm diameter is determined by the number of fibers it contains. The distribution of fiber diameters is very narrow and remains constant along the entire helix height. The fiber-diameter, which is characteristic for given material and ratio of substrate and melting point temperatures, is in the order of a few nanometers. The crystalline nature of the growing material has only a minor influence on the fiber diameter. Additionally, we find that the columns formed within a film deposited onto a stationary oblique substrate are also composed of many individual fibers. The helix- and pillar-size distribution is much narrower within a regular unpatterned (randomly nucleated) array. This can be attributed to regularity of the shadowing between structures within a regular array. Anisotropy of shadowing within a regular square array arises from the varying distance of shadow-providing neighbors as substrate is rotated. This anisotropy has only a minor influence on the final shape of the pillars or helices. The helices within a random array start growth from a single fiber and exhibit a very narrow size distribution before the onset of bifurcation. This narrow size-distribution was observed when the helix arm diameter (= fiber diameter) is below the lower limit of scaling of the thin-film microstructure. |
|---|
| Date de publication | 2000-10-06 |
|---|
| Langue | anglais |
|---|
| Publications évaluées par des pairs | Non |
|---|
| Publication du CNRC | Cette publication n’est pas du CNRCCe sont des publications qui ont été rédigées par un auteur du CNRC, mais avant que celui-ci soit employé du CNRC. |
|---|
| Identificateur | TF+NS-FrM3 |
|---|
| Exporter la notice | Exporter en format RIS |
|---|
| Signaler une correction | Signaler une correction (s'ouvre dans un nouvel onglet) |
|---|
| Identificateur de l’enregistrement | 211bd066-82c1-4a79-ba7a-39595fbb2cc9 |
|---|
| Enregistrement créé | 2020-10-07 |
|---|
| Enregistrement modifié | 2020-10-07 |
|---|
