Yttria-stabilized zirconia thermal barriers sprayed using N₂-H₂ and Ar-H₂ plasmas: influence of processing and heat treatment on coating properties

Par Conseil national de recherches du Canada

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DOI	Trouver le DOI : https://doi.org/10.1007/s11666-007-9093-9
Auteur	Rechercher : Marple, B. R.¹; Rechercher : Lima, R. S.¹; Rechercher : Moreau, C.¹; Rechercher : Kruger, S. E.¹; Rechercher : Xie, L.; Rechercher : Dorfman, M. R.
Affiliation	Conseil national de recherches Canada. Institut des matériaux industriels du CNRC
Format	Texte, Article
Sujet	deposition efficiency; elastic properties; in-flight particle characteristics; nitrogen-hydrogen plasmas; thermal barrier coating; thermal diffusivity; thermal treatment
Résumé	Thermal barrier coatings were produced using both Ar and N₂ as the primary plasma gas. Various aspects of the process and the coatings were investigated. It was found that higher in-flight particle temperatures could be produced using N₂, but particle velocities were lower. Deposition efficiencies could be increased by a factor of two by using N₂ as compared to Ar. Coatings having similar values of porosity, hardness, Young's modulus, and thermal diffusivity could be produced using the two primary gases. The coatings exhibited similar changes (increased hardness, stiffness, and thermal diffusivity) when heat-treated at 1400 °C. However, the N₂-processed coatings tended to have lower values of Young's modulus and thermal diffusivity following such treatment. The results point to the potential advantage, in terms of reduced powder consumption and increased production rate, of using N₂ as compared to Ar as the primary plasma gas for TBC deposition.
Date de publication	2007-07-01
Dans	Journal of Thermal Spray Technology 16, nº 5-6 (1 juillet 2007) : 791–797.
Langue	anglais
Publications évaluées par des pairs	Oui
Numéro du CNRC	NRCC 49400
Numéro NPARC	15782943
Exporter la notice	Exporter en format RIS
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Identificateur de l’enregistrement	0a97f975-496f-4ad5-a95f-d27f2a361f97
Enregistrement créé	2010-07-06
Enregistrement modifié	2020-05-10

Date de modification :: 2026-01-23