Copper ion assisted photochemical vapor generation of chlorine for its sensitive determination by sector field inductively coupled plasma mass spectrometry
Copper ion assisted photochemical vapor generation of chlorine for its sensitive determination by sector field inductively coupled plasma mass spectrometry
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DOI | Resolve DOI: https://doi.org/10.1021/acs.analchem.8b00035 |
Author | Search for: Hu, Jing1; Search for: Sturgeon, Ralph E.1; Search for: Nadeau, Kenny1; Search for: Hou, Xiandeng; Search for: Zheng, Chengbin; Search for: Yang, Lu1 |
Name affiliation |
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Format | Text, Article |
Journal title | Analytical Chemistry |
ISSN | 0003-2700 1520-6882 |
Volume | 90 |
Issue | 6 |
Pages | 4112–4118 |
Subject | chlorine; photochemical vapor generation; copper; ICP-MS |
Abstract | |
Publication date | 2018-03-01 |
Publisher | American Chemical Society |
Language | English |
Peer reviewed | Yes |
NPARC number | 23002978 |
Export citation | Export as RIS |
Report a correction | Report a correction |
Record identifier | ee145ae8-0fda-476f-89d3-28ac20be6438 |
Record created | 2018-04-03 |
Record modified | 2020-05-30 |