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2x2 ultra-broadband multimode interference coupler with subwavelength gratings fabricated by immersion lithography

From National Research Council Canada

DOIResolve DOI: https://doi.org/10.1109/PN58661.2023.10222958
AuthorSearch for: 1; Search for: 2; Search for: 2; Search for: 2; Search for: 2; Search for: 2; Search for: 2; Search for: 2; Search for: 3, 4; Search for: 1; Search for: 1; Search for: 2
Affiliation
  1. LETI, Université Grenoble Alpes et CEA
  2. Université Paris-Saclay, Centre de Nanosciences et de Nanotechnologies
  3. National Research Council of Canada. Advanced Electronics and Photonics
  4. National Research Council of Canada. Advanced Electronics and Photonics
FormatText, Article
Conference2023 Photonics North (PN), June 12-15, 2023, Montreal, Quebec, Canada
Subjectimmersion lithography; silicon photonics; subwavelength grating nanostructures; ultra-broadband MMI; ultra-wideband (UWB); fabrication; excess loss; multi-mode interference; multi-mode interference coupler; power imbalance; sub-wave length grating; ultra-broadhand multimode interference; nanostructures
Abstract
We demonstrate an ultra-broadband 2x2 multimode interference (MMI) coupler leveraging subwavelength grating (SWG) nanostructures fabricated by immersion lithography. Excess loss of ‹2 dB, power imbalance ‹1.5 dB and phase error ‹5° have been measured for a wavelength range of 1300 - 1680 nm. The small feature sizes, down to 75 nm, were well-defined using immersion lithography and optimized optical proximity correction. © 2023 IEEE.
Publication date
PublisherIEEE
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LanguageEnglish
Peer reviewedYes
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Record identifiere2312840-0ee4-4e12-8741-85ef4ddb64e0
Record created2024-07-10
Record modified2024-07-17
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