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Ordered CdSe nanoparticles within self-assembled block copolymer domains on surfaces

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DOIResolve DOI: https://doi.org/10.1021/la0629274
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FormatText, Article
Abstract
Hierarchical, high-density, ordered patterns were fabricated on Si substrates by self-assembly of CdSe nanoparticles within ∼20-nm-thick diblock copolymer films in a controlled manner. Surface-modified CdSe nanoparticles formed well-defined structures within microphase-separated polystyrene-b-poly(2-vinylpyridine) (PS-b-P2VP) domains. Trioctylphosphine oxide (TOPO)-coated CdSe nanoparticles were incorporated into PS domains and polyethylene glycol-coated CdSe nanoparticles were located primarily in the P2VP domains. Nearly close-packed CdSe nanoparticles were clearly identified within the highly ordered patterns on Si substrates by scanning electron microscopy (SEM). Contact angle measurements together with SEM results indicate that TOPO-CdSe nanoparticles were partially placed at the air/copolymer interface.
Publication date
PublisherAmerican Chemical Society
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  • Langmuir 23, no. 4: 1612–1614.
LanguageEnglish
Peer reviewedYes
NRC publication
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Record identifierdb86dae3-0d2c-439f-97c0-abc036993a55
Record created2019-04-15
Record modified2020-05-30
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