Structure of Hafnium silicate films formed by atomic layer deposition
Structure of Hafnium silicate films formed by atomic layer deposition
DOI | Resolve DOI: https://doi.org/10.1149/1.3206616 |
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Author | Search for: Liu, J.; Search for: Wu, X.1; Search for: Lennard, W. N.; Search for: Landheer, D.1 |
Name affiliation |
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Format | Text, Article |
Journal title | ECS Transactions |
ISSN | 1938-5862 1938-6737 |
Volume | 25 |
Issue | 6 |
Pages | 163–172 |
Abstract | |
Publication date | 2009 |
Language | English |
Peer reviewed | Yes |
NPARC number | 21276871 |
Export citation | Export as RIS |
Report a correction | Report a correction | Record identifier | cb2f666e-e529-4ec1-91b3-b0a0c3877302 |
Record created | 2015-10-27 |
Record modified | 2020-04-16 |