| DOI | Resolve DOI: https://doi.org/10.1149/1.3206616 |
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| Author | Search for: Liu, J.; Search for: Wu, X.1; Search for: Lennard, W. N.; Search for: Landheer, D.1 |
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| Name affiliation | - National Research Council of Canada. NRC Institute for Microstructural Sciences
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| Format | Text, Article |
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| Abstract | Hf distributions in as-grown and annealed (HfO2)0.25(SiO2)0.75 films with thicknesses in the range 4-13 nm were investigated by high resolution transmission electron microscopy (HRTEM), angle resolved X-ray photoelectron spectroscopy (ARXPS) and medium energy ion scattering (MEIS). HRTEM images show a layered structure in films thinner than 8 nm. ARXPS data also show a non-uniform distribution of Hf throughout the film depth. A diffusion of SiO2 to the film surface after a longer time anneal was observed by MEIS. All these observations provide evidence for surface-directed spinodal decomposition in the pseudobinary (HfO2)x(SiO2)1-x alloy system. |
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| Publication date | 2009 |
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| In | |
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| Language | English |
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| Peer reviewed | Yes |
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| NPARC number | 21276871 |
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| Export citation | Export as RIS |
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| Report a correction | Report a correction |
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| Record identifier | cb2f666e-e529-4ec1-91b3-b0a0c3877302 |
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| Record created | 2015-10-27 |
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| Record modified | 2020-04-16 |
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