Structure of Hafnium silicate films formed by atomic layer deposition

From National Research Council Canada

DOIResolve DOI: https://doi.org/10.1149/1.3206616
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Name affiliation
  1. National Research Council of Canada. NRC Institute for Microstructural Sciences
FormatText, Article
Journal titleECS Transactions
ISSN1938-5862
1938-6737
Volume25
Issue6
Pages163–172
Abstract
Hf distributions in as-grown and annealed (HfO2)0.25(SiO2)0.75 films with thicknesses in the range 4-13 nm were investigated by high resolution transmission electron microscopy (HRTEM), angle resolved X-ray photoelectron spectroscopy (ARXPS) and medium energy ion scattering (MEIS). HRTEM images show a layered structure in films thinner than 8 nm. ARXPS data also show a non-uniform distribution of Hf throughout the film depth. A diffusion of SiO2 to the film surface after a longer time anneal was observed by MEIS. All these observations provide evidence for surface-directed spinodal decomposition in the pseudobinary (HfO2)x(SiO2)1-x alloy system.
Publication date
LanguageEnglish
Peer reviewedYes
NPARC number21276871
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