| Author | Search for: Malac, M.; Search for: Lau, J.; Search for: Egerton, R.; Search for: Freeman, M.; Search for: Zhu, Y. |
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| Format | Text, Article |
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| Conference | 49th International Symposium of the American Vacuum Society, November 3-8, 2002, Denver, Colorado |
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| Abstract | We have studied the processes determining the resolution limits of contamination patterning in a transmission electron microscope (TEM) as a means to produce magnetic nanostructures. By optimizing the exposure parameters we achieved linewidth of 7 nm. Sputter etch was used to transfer the pattern to cobalt, permalloy and bismuth films on silicon nitride membranes. Previously the resolution of the technique was determined by the crystallite size of the patterned film. We have investigated patterning of our structures within one large crystallite and we have studied the limitations dictated by the kinetics of the surface diffusion processes. A comparison of pattern writing at conditions when importance of surface diffusion is suppressed (high dose rate and high writing speed) with diffusion controlled writing (slow writing at low dose rate) was made. We have explored the reproducibility and suitability of different types of materials for precontaminating the samples. Transmission electron microscopy, electron holography, electron energy loss spectroscopy and high resolution TEM was used to characterize structure and to study properties of such structures. |
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| Publication date | 2002-11-07 |
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| Publisher | American Vacuum Society |
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| In | |
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| Language | English |
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| Peer reviewed | Yes |
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| NRC publication | This is a non-NRC publication"Non-NRC publications" are publications authored by NRC employees prior to their employment by NRC. |
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| Identifier | PN-ThA2 |
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| Export citation | Export as RIS |
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| Report a correction | Report a correction (opens in a new tab) |
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| Record identifier | b7bf28cb-630d-4666-9d77-9ea265cf511e |
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| Record created | 2020-10-08 |
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| Record modified | 2020-10-08 |
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