Reactive gas ion beam generation using single atom W(111) gas field ion sources

DOI	Resolve DOI: https://doi.org/10.1017/S1431927616003937
Author	Search for: Urban, R.¹; Search for: Moritani, H.¹; Search for: Wolkow, R. A.¹; Search for: Pitters, J. L.¹
Name affiliation	National Research Council of Canada. National Institute for Nanotechnology
Format	Text, Article
Abstract	The scanning ion microscopy is gaining momentum as it provides several key advantages over scanning electron microscopy: (i) enhanced depth of focus, (ii) improved surface and element sensitivity, (iii) better lateral resolution, and (iv) nanomachining and milling. It uses different ions to achieve these tasks ranging from inert gases like helium and neon for imaging and ion milling. Other gases such as argon, nitrogen, and oxygen have potential for further sputtering and etching. It is therefore crucial that gas field ion sources provide necessary robustness and stability for range of various gases.
Publication date	2016-07
In	Microscopy and Microanalysis 22, no. S3: 616–617.
Language	English
Peer reviewed	Yes
NPARC number	23001313
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Record identifier	b1155f34-c5f9-4c74-b920-7491dec808ea
Record created	2017-01-17
Record modified	2020-03-16