Electronic transport study of high-deposition-rate HWCVD a-Si:H by the microwave photomixing technique
Electronic transport study of high-deposition-rate HWCVD a-Si:H by the microwave photomixing technique
DOI | Resolve DOI: https://doi.org/10.1557/PROC-664-A23.4 |
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Author | Search for: ; Search for: ; Search for: ; Search for: |
Format | Text, Article |
Conference | 2001 MRS Spring Meeting: Symposium A: Amorphous and Heterogeneous Silicon-Based Films, April 16-20, 2001, San Francisco, California, U.S.A. |
Abstract | |
Publication date | 2001 |
In | |
Series | |
Peer reviewed | Yes |
NRC publication | This is a non-NRC publication"Non-NRC publications" are publications authored by NRC employees prior to their employment by NRC. |
NPARC number | 12346687 |
Export citation | Export as RIS |
Report a correction | Report a correction (opens in a new tab) |
Record identifier | 9c071cd1-779a-4cdc-9f04-ed018e34441c |
Record created | 2009-09-17 |
Record modified | 2020-03-27 |
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