| Author | Search for: Landheer, D.1; Search for: Gupta, J. A.1; Search for: Wu, X.1; Search for: Sproule, G. I.1; Search for: Moisa, S.1; Search for: Quance, T.1; Search for: Graham, M. J.1; Search for: Baumvol, I. J. R.; Search for: Morais, J.; Search for: Lennard, W. N. |
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| Affiliation | - National Research Council of Canada. NRC Institute for Microstructural Sciences
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| Format | Text, Article |
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| Conference | Materials Research Society Workshop Series: International Workshop on Devices Technology: Alternatives to SiO2 as Gate Dielectric for Future Si-Based Microelectronics, 3-5 September 2001 |
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| Language | English |
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| NPARC number | 12346177 |
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| Export citation | Export as RIS |
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| Report a correction | Report a correction (opens in a new tab) |
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| Record identifier | 9a955279-55ed-4dc8-9a67-2f024bd4d93d |
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| Record created | 2009-09-17 |
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| Record modified | 2020-04-16 |
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