| DOI | Resolve DOI: https://doi.org/10.1116/1.4821194 |
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| Author | Search for: Diao, Z.1; Search for: Losby, J.E.1; Search for: Burgess, J.A.J.1; Search for: Sauer, V.T.K.1; Search for: Hiebert, W.K.1; Search for: Freeman, M.R.1 |
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| Affiliation | - National Research Council of Canada. National Institute for Nanotechnology
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| Format | Text, Article |
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| Subject | Electron beam patterning; Fabrication process; Hydrofluoric acid etching; Nanomechanical device; Nanomechanical resonators; Silicon-on-insulator substrates; Surface micromachined structure; Wide temperature ranges; Hydrofluoric acid; Magnetic moments; Magnetostatics; Nanostructures; Resonators; Thermomechanical treatment; Fabrication |
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| Abstract | The authors report a highly flexible process for nanostructure lithography to incorporate specific functions in micro- and nanomechanical devices. The unique step involves electron beam patterning on top of released, resist-supported, surface micromachined structures, hence avoiding hydrofluoric acid etching of sensitive materials during the device release. The authors demonstrate the process by creating large arrays of nanomechanical torque magnetometers on silicon-on-insulator substrates. The fabricated devices show a thermomechanical noise-limited magnetic moment sensitivity in the range of 5 × 106 μB at room temperature and can be utilized to study both magnetostatics and dynamics in nanomagnets across a wide temperature range. The fabrication process can be generalized for the deposition and patterning of a wide range of materials on micro-/nanomechanical resonators. © 2013 Crown. |
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| Publication date | 2013 |
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| In | |
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| Language | English |
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| Peer reviewed | Yes |
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| NPARC number | 21269841 |
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| Export citation | Export as RIS |
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| Report a correction | Report a correction (opens in a new tab) |
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| Record identifier | 98c5f1ee-742d-4bdc-9274-bb6dbc13c901 |
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| Record created | 2013-12-13 |
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| Record modified | 2020-04-22 |
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