| DOI | Resolve DOI: https://doi.org/10.1364/OE.11.000775 |
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| Author | Search for: Taylor, Rod1; Search for: Hnatovsky, C.1; Search for: Simova, E.1; Search for: Rayner, David2; Search for: Mehandale, M.2; Search for: Bhardwaj, V. R.2; Search for: Corkum, Paul2 |
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| Affiliation | - National Research Council of Canada. NRC Institute for Microstructural Sciences
- National Research Council of Canada. NRC Steacie Institute for Molecular Sciences
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| Format | Text, Article |
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| Abstract | The combination of selective chemical etching and atomic force microscopy has been used for the first time to make ultra-high spatial resolution (20 nm) index of refraction profiles of femtosecond laser modified structures in silica glass. |
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| Publication date | 2003 |
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| In | |
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| Peer reviewed | Yes |
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| NPARC number | 12330181 |
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| Export citation | Export as RIS |
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| Report a correction | Report a correction (opens in a new tab) |
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| Record identifier | 8aef6a57-3ab1-437b-9ff3-e6d299007468 |
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| Record created | 2009-09-10 |
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| Record modified | 2020-04-02 |
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