Simultaneous multiple file EXAFS analysis: methodology and application to buried Ge–Si interfaces

DOI	Resolve DOI: http://doi.org/10.7567/JJAPS.32S2.134
Author	Search for: Tyliszczak, T.; Search for: Aebi, P.; Search for: Hitchcock, A. P.; Search for: Jackman, T. E.¹ ; Search for: Baribeau, J-M.¹ ; Search for: Lockwood, D. J.¹
Name affiliation	National Research Council Canada. NRC Institute for Microstructural Sciences
Type	Article
Proceedings title	XAFS VII: proceedings of the 7th International Conference on X-ray Absorption Fine Structure, Kobe, Japan, August 23-29, 1992
Series title	Japanese Journal of Applied Physics; Volume 32
Conference	XAFS VII, the 7th International Conference on X-ray Absorption Fine Structure, August 23-29, 1992, Kobe, Japan
ISSN	0021-4922 1347-4065
Pages	134–136
Subject	EXAFS; multi-file analysis; Si-Ge interface; atomic-layer superlattices; epitaxy
Abstract	Procedures for constrained simultaneous non-linear least squares curve fits of multiple EXAFS spectra are described and their advantages discussed. The techniques are illustrated by polarisation-dependent GeK EXAFS studies of buried Ge-Si interfaces in strained layer [(Si)m(Ge)n]p/Si(100) superlattices grown by molecular beam epitaxy (MBE).
Publication date	1993-01-01
Publisher	IOP Publishing
Language	English
Peer reviewed	Yes
NPARC number	23000867
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Record identifier	87b05cec-9cb9-4f7b-92fb-c24f560cb749
Record created	2016-10-26
Record modified	2016-10-26