Growth and characterization of metastable hexagonal nickel thin films via plasma-enhanced atomic layer deposition

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  1. National Research Council of Canada. Nanotechnology
FormatText, Article
SubjectAFM; atomic layer deposition; HCP; hexagonal; nickel; TEM; XRD
Publication date
PublisherAmerican Chemical Society
Peer reviewedYes
NPARC number23003091
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Record identifier82479cdb-9a3f-44b4-88f0-24c6dd0f3e62
Record created2018-04-19
Record modified2020-05-30
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