| DOI | Resolve DOI: https://doi.org/10.1007/s00339-006-3590-4 |
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| Author | Search for: Hnatovsky, C.; Search for: Taylor, Rod1; Search for: Simova, E.2; Search for: Rajeev, P. P.2; Search for: Rayner, David2; Search for: Bhardwaj, V. R.; Search for: Corkum, Paul2 |
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| Affiliation | - National Research Council Canada. NRC Institute for Microstructural Sciences
- National Research Council Canada. NRC Steacie Institute for Molecular Sciences
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| Format | Text, Article |
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| Abstract | We use the combination of femtosecond laser dielectric modification and selective chemical etching to fabricate high-quality microchannels in glass. The photoinduced modification morphology has been studied in fused silica and in borosilicate glass BK7, using ultra-high spatial resolution techniques of selective chemical etching followed by atomic force or scanning electron microscopy. The analysis shows that the high differential etch rate inside the modified regions, is determined by the presence of polarization-dependent self-ordered periodic nanocracks or nanoporous structures. We also investigate the optimum irradiation conditions needed to produce high-aspect ratio microchannels with small symmetric cross-sections and smooth walls. |
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| Publication date | 2006 |
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| In | |
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| Peer reviewed | Yes |
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| NPARC number | 12330048 |
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| Export citation | Export as RIS |
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| Report a correction | Report a correction (opens in a new tab) |
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| Record identifier | 6ff98159-546e-4b20-9bb7-3d6bb0d92c85 |
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| Record created | 2009-09-10 |
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| Record modified | 2020-04-22 |
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