Well-resolved band-edge photoluminescence from strained Si[1-x]Ge[x] layers grown by rapid thermal chemical vapor deposition
Well-resolved band-edge photoluminescence from strained Si[1-x]Ge[x] layers grown by rapid thermal chemical vapor deposition
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| Sponsor | Search for: MRS |
| Format | Text, Article |
| Conference | Silicon molecular beam epitaxy : symposium, April 29-May 3, 1991, Anaheim, California, USA |
| ISSN | 0272-9172 |
| ISBN | 155899114X |
| Language | English |
| NRC number | NRC-INMS-1199 |
| NPARC number | 8900718 |
| Export citation | Export as RIS |
| Report a correction | Report a correction (opens in a new tab) |
| Record identifier | 69cd13db-046a-4d89-85cc-b8f1fab6cee6 |
| Record created | 2009-04-22 |
| Record modified | 2020-04-16 |
- Date modified: