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Adhesion Evaluation of Plasma-Deposited Si3N4 and SiO2 Thin Films on Si by the Scratch Method

From National Research Council Canada

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Affiliation
  1. National Research Council Canada. NRC Institute for Aerospace Research
  2. National Research Council Canada. NRC Institute for Research in Construction
  3. Ecole Polytechnique
FormatText, Other
PlaceVancouver
Access condition
  • unclassified/unlimited
NRC numberSMPL-1995-0058
NPARC number8929198
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Record identifier637a1218-0a45-466e-8fbb-f1f8632f5ca5
Record created2009-04-23
Record modified2020-03-03
Date modified: