Language selection

Government of Canada / Gouvernement du Canada

Search

Atomic Layer Deposition of Hafnium Silicate Thin Films Using Tetrakis(diethylamido)hafnium and Tris(2-methyl-2-butoxy)silanol

From National Research Council Canada

DOIResolve DOI: https://doi.org/10.1149/1.3137053
AuthorSearch for: ; Search for: ; Search for: ; Search for: 1; Search for: 1; Search for: ; Search for:
Affiliation
  1. National Research Council of Canada. NRC Institute for Microstructural Sciences
FormatText, Article
Publication date
In
  • Journal of The Electrochemical Society 156, no. 8 (2009): G89–G96.
LanguageEnglish
Peer reviewedYes
NPARC number12441141
Export citationExport as RIS
Report a correctionReport a correction (opens in a new tab)
Record identifier5eecfa14-2819-431f-8c40-ddd7791d189a
Record created2009-09-25
Record modified2023-04-19
Date modified: