| DOI | Resolve DOI: https://doi.org/10.1016/0010-938X(95)00034-H |
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| Author | Search for: Prescott, R.1; Search for: Mitchell, D. F.1; Search for: Graham, M. J.1; Search for: Doychak, J. |
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| Affiliation | - National Research Council of Canada. NRC Institute for Microstructural Sciences
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| Format | Text, Article |
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| Abstract | The oxidation mechanisms of single crystal Zr-doped β-NiAl from 800 to 1200 °C were determined using primarily secondary ion mass spectrometry (SIMS) imaging and depth profiling. High spatial resolution SIMS imaging provides a means for critically assessing the effects of diffusion through the boundaries of the various morphologies of α-Al2O3 scales that form on β-NiAl. Transient oxidation occurs by outward Al diffusion through transition Al2O3 scales, θ-Al2O3 in this case, for temperatures from 800 to 1100 °C. Steady-state oxidation occurs by counter-diffusion of oxygen inward and both Al and Zr outward through boundaries in the α-Al2O3 ridge morphology. |
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| Publication date | 1995-09 |
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| In | |
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| Language | English |
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| Peer reviewed | Yes |
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| NPARC number | 12338717 |
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| Export citation | Export as RIS |
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| Report a correction | Report a correction (opens in a new tab) |
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| Record identifier | 594f75ee-b73e-4d92-9867-6192285abcee |
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| Record created | 2009-09-10 |
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| Record modified | 2020-04-29 |
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