| DOI | Resolve DOI: https://doi.org/10.1016/j.mee.2009.11.098 |
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| Author | Search for: Glinsner, T.; Search for: Veres, T.1; Search for: Kreindl, E.; Search for: Morton, K.1; Search for: Wieser, T.; Search for: Thanner, C.; Search for: Treiblmayr, D.; Search for: Miller, R.; Search for: Lindner, P. |
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| Affiliation | - National Research Council of Canada. NRC Industrial Materials Institute
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| Format | Text, Article |
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| Subject | hot embossing; soft working stamps; de-embossing; spin-on layer; high resolution |
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| Abstract | Nanoimprint lithography (NIL) is a fast replication technology for structures with sizes ranging from micrometer down to few nanometers range. This paper describes the technology for imprinting of polymer substrates as well as spin-on polymers by using soft working stamp materials. A fully automated hot embossing system, the EVG®750 was built to use this rapid replication processes. By utilizing soft working stamps, we demonstrate the possibility to replicate, in fully automated mode, both high-aspect ratio features in thermoplastic materials as needed for microfluidic lab-on-chip applications as well as high resolution features down to 50 nm in polymer that can be used as templates for pattern transfer in the fabrication of plasmonic substrates for bio-sensing applications. |
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| Publication date | 2009-11-24 |
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| Publisher | Elsevier |
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| In | |
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| Language | English |
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| Peer reviewed | Yes |
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| NPARC number | 23002043 |
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| Export citation | Export as RIS |
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| Report a correction | Report a correction (opens in a new tab) |
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| Record identifier | 40c53f07-bc23-4a48-9d1e-bf6ce6176d07 |
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| Record created | 2017-07-27 |
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| Record modified | 2020-04-16 |
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