Nanoscale plasmonic stamp lithography on silicon
Nanoscale plasmonic stamp lithography on silicon
Download | |
---|---|
DOI | Resolve DOI: https://doi.org/10.1021/acsnano.5b00312 |
Author | Search for: Liu, Fenglin1; Search for: Luber, Erik J.1; Search for: Huck, Lawrence A.1; Search for: Olsen, Brian C.1; Search for: Buriak, Jillian M.1 |
Name affiliation |
|
Format | Text, Article |
Journal title | ACS Nano |
ISSN | 1936-0851 |
Volume | 9 |
Issue | 2 |
Pages | 2184–2193 |
Subject | Block copolymers; Copolymers; Electric fields; Films; Functional materials; Gold; Hydrosilylation; Lithography; Nanolithography; Nanotechnology; Semiconducting silicon; Semiconductor device manufacture; Silicon; Surface plasmon resonance; Block copolymer self-assembly; Directed self-assembly; Electron hole pairs; Functionalizations; Localized surface plasmon; Nano pattern; Nanoscale lithography; Semiconductor industry; Plasmons |
Abstract | |
Publication date | 2015-02-05 |
Publisher | ACS Publications |
Language | English |
Peer reviewed | Yes |
NPARC number | 21275801 |
Export citation | Export as RIS |
Report a correction | Report a correction | Record identifier | 4036d732-6acd-437a-a79c-ea18086002db |
Record created | 2015-07-14 |
Record modified | 2020-06-04 |