Damage formation on fused silica illuminated with ultraviolet-infrared femtosecond pulse pairs

From National Research Council Canada

DOIResolve DOI: https://doi.org/10.1117/12.2182633
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Name affiliation
  1. National Research Council Canada. Security and Disruptive Technologies
FormatText
TypeArticle
Proceedings titleDamage to VUV, EUV, and X-ray Optics V
Series titleProceedings of SPIE; no. 9511
ConferenceSPIE Optics + Optoelectronics, April 13-15, 2015, Prague, Czech Republic
ISSN0277-786X
1996-756X
ISBN9781628416329
Article number95110C
Subjectelectromagnetic pulse; fused silica; ionization; laser pulses; multiphoton processes; photoionization; time delay; ultrafast lasers; ultrashort pulses; X-ray optics; avalanche ionization; damage formation; femtosecond laser machining; multi-photon absorption; multiphoton ionization; pulse durations; rate-equation models; UV pulse; pulse generators
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PublisherSPIE
LanguageEnglish
Peer reviewedYes
NPARC number21276938
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Record identifier3da4efff-3cef-4511-a9d1-b992f7bc0083
Record created2015-11-10
Record modified2019-08-23
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