| DOI | Resolve DOI: https://doi.org/10.1007/s11082-012-9563-2 |
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| Author | Search for: Halir, R.; Search for: Zavargo-Peche, L.; Search for: Xu, D.-X.1; Search for: Cheben, P.1ORCID identifier: https://orcid.org/0000-0003-4232-9130; Search for: Ma, R.1; Search for: Schmid, J. H.1; Search for: Janz, S.1; Search for: Densmore, A.1; Search for: Ortega-Moñux, A.; Search for: Molina-Fernández, Í.; Search for: Fournier, M.; Search for: Fédeli, J.-M. |
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| Affiliation | - National Research Council of Canada. NRC Institute for Microstructural Sciences
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| Format | Text, Article |
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| Subject | fiber-to-chip grating coupler; deep ultraviolet lithography; single etch process |
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| Abstract | Surface grating couplers enable efficient coupling of light between optical fibers and planar waveguide circuits. While traditional grating designs require two etch steps for efficient coupling to silicon-on-insulator waveguides, recently proposed subwavelength structured gratings can achieve the same coupling efficiencies with a single etch step, thereby significantly reducing fabrication complexity. Here we demonstrate that such couplers can be fabricated on a large scale with ultra-violet lithography, achieving a 5 dB coupling efficiency at 1,550 nm. Through both simulations and experiments we give physical insight on how pattern fidelity impacts the performance of these couplers, and propose strategies to deal with inevitable process variations. |
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| Publication date | 2012-02-24 |
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| In | |
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| Language | English |
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| Peer reviewed | Yes |
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| Identifier | 9563 |
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| NPARC number | 21268395 |
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| Export citation | Export as RIS |
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| Report a correction | Report a correction (opens in a new tab) |
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| Record identifier | 3ae6e66a-103d-4df0-8445-37629981b59d |
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| Record created | 2013-07-10 |
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| Record modified | 2020-04-21 |
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