| DOI | Resolve DOI: https://doi.org/10.1002/adma.200700731 |
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| Author | Search for: Hessel, Colin M.; Search for: Summers, Mark A.; Search for: Meldrum, Al; Search for: Malac, Marek1; Search for: Veinot, Jonathan G. C. |
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| Affiliation | - National Research Council Canada. National Institute for Nanotechnology
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| Format | Text, Article |
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| Subject | coatings; doping; erbium; luminescence; nanocrystals, inorganic; patterning; silica; silicon |
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| Abstract | Hydrogen silsesquioxane is used as a solution-borne molecular precursor in the fabrication of highly luminescent thin films of SiO2 containing silicon nanocrystals. Films are readily formed on non-flat substrates (e.g., optical fibers) and patterned using e-beam lithography (see figure). |
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| Publication date | 2007-10-16 |
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| In | |
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| Language | English |
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| Peer reviewed | Yes |
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| NPARC number | 12330151 |
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| Export citation | Export as RIS |
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| Report a correction | Report a correction (opens in a new tab) |
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| Record identifier | 225de054-1e1c-44a4-a7a0-3fc5a4a2af03 |
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| Record created | 2009-09-10 |
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| Record modified | 2020-05-10 |
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