Degradation mechanism at XLPE/semicon interface subjected to high electrical stress
Degradation mechanism at XLPE/semicon interface subjected to high electrical stress
| DOI | Resolve DOI: https://doi.org/10.1109/14.78329 |
|---|---|
| Author | Search for: ; Search for: ; Search for: ; Search for: |
| Format | Text, Article |
| Publication date | 1991 |
| In | |
| Language | English |
| NRC number | NRC-INMS-1628 |
| NPARC number | 8898698 |
| Export citation | Export as RIS |
| Report a correction | Report a correction (opens in a new tab) |
| Record identifier | 1713dea3-e9f1-41f9-a52c-bb7609eed2e5 |
| Record created | 2009-04-22 |
| Record modified | 2020-03-17 |
- Date modified: