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Smooth wet etching by UV-assisted photoetching and its application to the fabrication of AlGaN/GaN heterostructure field-effect transistors

From National Research Council Canada

DOIResolve DOI: https://doi.org/10.1063/1.1330226
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Affiliation
  1. National Research Council of Canada. NRC Institute for Microstructural Sciences
  2. National Research Council of Canada. NRC Steacie Institute for Molecular Sciences
FormatText, Article
Publication date
In
  • Applied Physics Letters 77, no. 23 (2000): 3833–.
LanguageEnglish
Peer reviewedYes
NPARC number12327979
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Record identifier075f0db7-e973-45d6-9b5a-5b87b171ba41
Record created2009-09-10
Record modified2023-05-10
Date modified: