| DOI | Resolve DOI: https://doi.org/10.1017/S1431927611008208 |
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| Author | Search for: Zhang, Huairuo1; Search for: Egerton, Ray F.1; Search for: Malac, Marek1 |
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| Affiliation | - National Research Council of Canada
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| Format | Text, Article |
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| Conference | Microscopy & Microanalysis 2011, August 7-11, 2011, Nashville, Tennessee, United States |
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| Abstract | Electron energy-loss spectroscopy (EELS) is routinely used to estimate local specimen thickness in a TEM. The relative specimen thickness is conveniently estimated from the low-loss spectrum using log-ratio method with a formula t/λ = ln(Iₜ /I₀). Here λ is an inelastic mean free path (IMFP) for the material in question, I₀ is the area under zero-loss peak (ZLP) and Iₜ the total area under the whole spectrum. An absolute thickness t measurement requires knowledge of the IMFP, which depends on the specimen material, electron energy and collection semiangle. The most commonly used IMFP formula, incorporated into Gatan Digital Micrograph software, was developed by Malis et al. and exhibits a smooth dependence on atomic number Z. |
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| Publication date | 2011-08-11 |
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| Publisher | Cambridge University Press |
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| In | |
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| Language | English |
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| Peer reviewed | Yes |
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| Export citation | Export as RIS |
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| Report a correction | Report a correction (opens in a new tab) |
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| Record identifier | 0655c119-b769-4dde-bdd1-8f7efd5ef076 |
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| Record created | 2020-03-11 |
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| Record modified | 2024-05-15 |
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