| DOI | Resolve DOI: https://doi.org/10.1364/OL.30.001867 |
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| Author | Search for: Hnatovsky, C.1; Search for: Taylor, R. S.1; Search for: Simova, E.1; Search for: Bhardwaj, V. R.1; Search for: Rayner, D. M.1; Search for: Corkum, P. B.1 |
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| Affiliation | - National Research Council Canada
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| Format | Text, Article |
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| Subject | laser materials processing; micro-optical devices; microstructure fabrication |
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| Abstract | We fabricate microchannels in fused silica by femtosecond laser irradiation followed by etching in diluted hydrofluoric acid. We show a dramatic dependence of the etch rate on the laser polarization, spanning 2 orders of magnitude. We establish the existence of an energy-per-pulse threshold at which etching of the laser-modified zones becomes highly polarization selective. The enhanced selective etching is due to long-range, periodic, polarization-dependent nanostructures formed in the laser-modified material. |
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| Publication date | 2005-07-15 |
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| In | |
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| Language | English |
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| Peer reviewed | Yes |
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| NPARC number | 12339171 |
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| Export citation | Export as RIS |
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| Report a correction | Report a correction (opens in a new tab) |
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| Record identifier | 06499752-0f0b-4708-85cb-5226381a0c5e |
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| Record created | 2009-09-11 |
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| Record modified | 2020-04-07 |
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