Automated defect and correlation length analysis of block copolymer thin film nanopatterns

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DOIResolve DOI: https://doi.org/10.1371/journal.pone.0133088
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FormatText
TypeArticle
Journal titlePLOS ONE
ISSN1932-6203
Volume10
Issue7
Article numbere0133088
Pages132
Abstract
Publication date
LanguageEnglish
Peer reviewedYes
NPARC number23000676
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Record identifier05a10406-2d39-44a8-8305-fc22b481da81
Record created2016-08-22
Record modified2016-08-22
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